Fundamentals of silicon integrated device technology : vol. 1, Oxidation, diffusion, and epitaxy /
edited by R.M. Burger and R.P. Donovan.
- Englewood Cliffs, N.J. : Printice-Hall, c1967.
- v. : ill. ; 24 cm.
- Prentice-Hall electrical engineering series .
Includes bibliographical references and index.
v. 1 Oxidation, diffusion, and epitaxy. v. 2. Bipolar and unipolar transistors.
67013671
GB67-18053
Microelectronics.
Silicon.
TK7874 / .B8
621.381 / BUF
Includes bibliographical references and index.
v. 1 Oxidation, diffusion, and epitaxy. v. 2. Bipolar and unipolar transistors.
67013671
GB67-18053
Microelectronics.
Silicon.
TK7874 / .B8
621.381 / BUF