Includes bibliographical references and index.

OLED Displays; Contents; Series Editor's Foreword; Preface; 1: Introduction; 2: OLED Display Structure; 2.1 OLED DEFINITION; 2.2 OLED DEVICE PRINCIPLES AND MECHANISMS; 2.2.1 Basic Device Structure; 2.2.2 Light Emission Mechanism; 2.2.3 Emission Efficiency; 2.2.4 Lifetime and Image Burning; 3: OLED Manufacturing Process; 3.1 MATERIAL PREPARATION; 3.1.1 Basic Material Properties; 3.1.2 Purification Process; 3.2 EVAPORATION PROCESS; 3.2.1 Principle; 3.2.2 Evaporation Sources; 3.3 SHADOW MASK PATTERNING; 3.4 ENCAPSULATION; 3.4.1 Dark Spot and Edge Growth Defects.

3.4.2 Light Emission from the Bottom and Top of the OLED Device3.5 PROBLEM ANALYSIS; 3.5.1 Ionization Potential Measurement; 3.5.2 HPLC Analysis; 3.5.3 Cyclic Voltammetry; 4: OLED Display Module; 4.1 COMPARISON BETWEEN OLED AND LCD MODULES; 4.2 BASIC DISPLAY DESIGN AND RELATED CHARACTERISTICS; 4.2.1 Luminous Intensity, Luminance, and Illuminance; 4.2.2 OLED Current and Power Efficiencies; 4.2.3 Color Reproduction; 4.2.4 Uniform Color Space; 4.2.5 White Point Determination; 4.3 PASSIVE-MATRIX OLED DISPLAY; 4.3.1 Structure; 4.3.2 Pixel Driving; 4.4 ACTIVE-MATRIX OLED DISPLAY.

4.4.1 OLED Module Components4.4.2 Two-Transistor One-Capacitor (2T1C) Driving Circuit; 4.4.3 Ambient Performance; 4.4.4 Subpixel Rendering; 5: TFT Substrate forOLED Driving; 5.1 TFT STRUCTURE; 5.2 TFT PROCESS; 5.2.1 Low-Temperature Polysilicon Process Overview; 5.2.2 Thin-Film Formation; 5.2.3 Patterning Technique; 5.2.4 Excimer Laser Crystallization; 5.3 MOSFET BASICS; 5.4 LTPS-TFT-DRIVEN OLED DISPLAY DESIGN; 5.4.1 OFF Current; 5.4.2 Driver TFT Size Restriction; 5.4.3 Restriction Due to Voltage Drop; 5.4.4 LTPS-TFT Pixel Compensation Circuit; 5.4.5 Circuit Integration by LTPS-TFT.

6: Next-Generation OLED Technologies6.1 COLOR-PATTERNING TECHNOLOGIES; 6.1.1 White + Color Filter Patterning; 6.1.2 Color Conversion Medium (CCM) Patterning; 6.1.3 Laser-Induced Thermal Imaging (LITI) Method; 6.1.4 Radiation-Induced Sublimation Transfer (RIST) Method; 6.1.5 Dual-Plate OLED Display (DOD) Method; 6.1.6 Other Methods; 6.2 SOLUTION-PROCESSED MATERIALS AND TECHNOLOGIES; 6.3 NEXT-GENERATION OLED MANUFACTURING TOOLS; 6.3.1 Vapor Injection Source Technology (VIST) Deposition; 6.3.2 Hot-Wall Method; 6.3.3 Organic Vapor-Phase Deposition (OVPD) Method; 6.4 OLED TELEVISION APPLICATIONS.

6.4.1 Performance Target6.4.2 High-Yield Manufacturing by White + Color Filter Method; 6.5 NEXT-GENERATION TFT TECHNOLOGIES FOR OLED DISPLAY; 6.5.1 Sequential Lateral Solidification (SLS) Method; 6.5.2 Microcrystalline and Superamorphous Silicon; 6.5.3 Solid-Phase Crystallization; 6.5.4 Oxide Semiconductors; 7: OLED Lighting; 7.1 COLOR RENDERING INDEX; 7.2 OLED LIGHTING REQUIREMENT; 7.2.1 Correlated Color Temperature (CCT); 7.2.2 Other Requirements; 7.3 LIGHT EXTRACTION ENHANCEMENT; 7.3.1 Microlens Array Structure; 7.3.2 Diffusion Structure; 7.3.3 Diffraction Structure.

This book covers all of the aspects necessary to the design and manufacturing of OLED displays. Topics include emission mechanism, material selection, device processing, manufacturing issues and countermeasures and display design basics. In addition, the book defines elements of OLED such as Thin Film Transistor (TFT) backplane design and processing details, including Low Temperature Poly Silicon (LTPS) process and circuit integration, and high yield method to manufacturer. Researchers and developers are aiming at making large OLED televisions and companies such as Samsung and Apple are rumore.