| 000 | 00948cam a2200289 i 4500 | ||
|---|---|---|---|
| 001 | 4110121 | ||
| 003 | BD-DhUL | ||
| 005 | 20141015094940.0 | ||
| 008 | 760810s1976 enka b 001 0 eng | ||
| 010 | _a 75196983 | ||
| 015 | _aGB*** | ||
| 020 | _a0126969507 | ||
| 040 |
_aDLC _cBD-DhUL _dBD-DhUL _dICU |
||
| 050 | 0 | 0 |
_aQC702.7.I55 _bT67 |
| 082 | 0 | 0 |
_a541.2 _219 _bTOI |
| 100 | 1 |
_aTownsend, P. D. _q(Peter David) |
|
| 245 | 1 | 0 |
_aIon implantation, sputtering and their applications / _cby P. D. Townsend, J. C. Kelly, N. E. W. Hartley. |
| 260 |
_aLondon ; _aNew York : _bAcademic Press, _c1976. |
||
| 300 |
_aix, 333 p. : _bill. ; _c24 cm. |
||
| 504 | _aIncludes bibliographies and index. | ||
| 650 | 0 | _aIon implantation. | |
| 650 | 0 | _aSputtering (Physics) | |
| 700 | 1 |
_aKelly, J. C. _q(John Clive), _ejoint author. |
|
| 700 | 1 |
_aHartley, N. E. W., _ejoint author. |
|
| 906 |
_a7 _bcbc _corignew _d2 _encip _f19 _gy-gencatlg |
||
| 942 |
_2ddc _cBK |
||
| 999 |
_c14684 _d14684 |
||