000 01250cam a2200313 a 4500
001 3561249
003 BD-DhUL
005 20141015095635.0
008 980623s1998 nyua b 001 0 eng
010 _a 98029986
020 _a0824790391 (alk. paper)
040 _aDLC
_cDLC
_dDLC
_dBD-DhUL
050 0 0 _aQD506
_b.E44 1998
082 0 0 _a541.33
_221
_bELE
245 0 0 _aElectrical phenomena at interfaces :
_bfundamentals, measurements, and applications.
250 _a2nd ed., rev. and expanded /
_bedited by Hiroyuki Ohshima, Kunio Furusawa.
260 _aNew York :
_bM. Dekker,
_cc1998.
300 _axiii, 628 p. :
_bill. ;
_c26 cm.
440 0 _aSurfactant science series ;
_vv. 76
504 _aIncludes bibliographical references and index.
650 0 _aSurface chemistry.
650 0 _aElectric double layer.
700 1 _aOhshima, Hiroyuki,
_d1944-
700 1 _aFurusawa, Kunio,
_d1937-
856 4 2 _3Publisher description
_uhttp://www.loc.gov/catdir/enhancements/fy0647/98029986-d.html
906 _a7
_bcbu
_corignew
_d1
_eocip
_f19
_gy-gencatlg
942 _2ddc
_cBK
955 _apc03 to ja00 06-23-98; jd20 to jk05 (for NARs) 06-24-98; jk05 to jd20 06-24-98; jd20 06-24-98; jd99 06-24-98; jd85 06-25-98; CIP ver. jc09 11-19-98
999 _c14689
_d14689