000 00837pam a2200253 i 4500
001 3245121
003 BD-DhUL
005 20150115122301.0
008 801003s1981 nyu b 001 0 eng
010 _a 80025156
020 _a0677055900
040 _aDLC
_cDLC
_dDLC
_dBD-DhUL
050 0 0 _aTK7871.99.M44
_bD38
082 0 0 _a621.38152
_bA261i
100 1 _aDavis, J. R.
_q(John Richard),
_d1951-
245 1 0 _aInstabilities in MOS devices /
_cJ. R. Davis.
260 _aNew York :
_bGordon and Breach Science Publishers,
_cc1981.
300 _axv, 175 p. :
_bill. ;
_c23 cm.
490 _aElectrocomponent science monographs ;
_vv. 12
504 _aIncludes bibliographical refererences (p. 151-175) and index.
650 0 _aMetal oxide semiconductors.
906 _a7
_bcbc
_corignew
_d1
_eocip
_f19
_gy-gencatlg
942 _2ddc
_cBK
999 _c31542
_d31542