000 | 00837pam a2200253 i 4500 | ||
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001 | 3245121 | ||
003 | BD-DhUL | ||
005 | 20150115122301.0 | ||
008 | 801003s1981 nyu b 001 0 eng | ||
010 | _a 80025156 | ||
020 | _a0677055900 | ||
040 |
_aDLC _cDLC _dDLC _dBD-DhUL |
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050 | 0 | 0 |
_aTK7871.99.M44 _bD38 |
082 | 0 | 0 |
_a621.38152 _bA261i |
100 | 1 |
_aDavis, J. R. _q(John Richard), _d1951- |
|
245 | 1 | 0 |
_aInstabilities in MOS devices / _cJ. R. Davis. |
260 |
_aNew York : _bGordon and Breach Science Publishers, _cc1981. |
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300 |
_axv, 175 p. : _bill. ; _c23 cm. |
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490 |
_aElectrocomponent science monographs ; _vv. 12 |
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504 | _aIncludes bibliographical refererences (p. 151-175) and index. | ||
650 | 0 | _aMetal oxide semiconductors. | |
906 |
_a7 _bcbc _corignew _d1 _eocip _f19 _gy-gencatlg |
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942 |
_2ddc _cBK |
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999 |
_c31542 _d31542 |