| 000 | 00828pam a2200277 a 4500 | ||
|---|---|---|---|
| 001 | 2896256 | ||
| 003 | BD-DhUL | ||
| 005 | 20150115144638.0 | ||
| 008 | 870929s1988 nyua b 001 0 eng | ||
| 010 | _a 87029077 | ||
| 020 | _a0306421852 | ||
| 040 |
_aDLC _cDLC _dDLC _dBD-DhUL |
||
| 050 | 0 | 0 |
_aTK7871.85 _b.M583 1988 |
| 082 | 0 | 0 |
_a621.38152 _bMOS |
| 100 | 1 | _aMoreau, Wayne M. | |
| 245 | 1 | 0 |
_aSemiconductor lithography : _bprinciples, practices, and materials / _cWayne M. Moreau. |
| 260 |
_aNew York : _bPlenum Press, _cc1988. |
||
| 300 |
_axx, 931 p. : _bill. ; _c25 cm. |
||
| 490 | _aMicrodevices | ||
| 504 | _aIncludes bibliographies and index. | ||
| 650 | 0 | _aSemiconductors. | |
| 650 | 0 | _aMicrolithography. | |
| 650 | 0 | _aPhotoresists. | |
| 906 |
_a7 _bcbc _corignew _d1 _eocip _f19 _gy-gencatlg |
||
| 942 |
_2ddc _cBK |
||
| 999 |
_c31671 _d31671 |
||