| 000 | 01092cam a22003014a 4500 | ||
|---|---|---|---|
| 001 | 15904147 | ||
| 003 | BD-DhUL | ||
| 005 | 20150115145618.0 | ||
| 008 | 090914s2010 waua b 001 0 eng | ||
| 010 | _a 2009036266 | ||
| 020 | _a9780819475626 (SPIE) | ||
| 020 | _a9781118030028 (Wiley) | ||
| 040 |
_aDLC _beng _cDLC _dDLC |
||
| 050 | 0 | 0 |
_aTP156.E68 _bO44 2010 |
| 082 | 0 | 0 |
_a621.381531 _222 _bOKC |
| 100 | 1 | _aOkoroanyanwu, Uzodinma. | |
| 245 | 1 | 0 |
_aChemistry and lithography / _cUzodinma Okoroanyanwu. |
| 260 |
_aHoboken, N.J. : _bWiley ; _aBellingham, Wash., USA : _bSPIE Press, _cc2010. |
||
| 300 |
_axxix, 861 p. : _bill. ; _c26 cm. |
||
| 504 | _aIncludes bibliographical references and index. | ||
| 650 | 0 | _aLithography. | |
| 650 | 0 | _aChemistry, Technical. | |
| 650 | 0 |
_aSemiconductors _xEtching. |
|
| 710 | 2 | _aSociety of Photo-optical Instrumentation Engineers. | |
| 906 |
_a7 _bcbc _corignew _d1 _eecip _f20 _gy-gencatlg |
||
| 942 |
_2ddc _cBK |
||
| 955 |
_brc15 2009-09-14 _irc15 2009-09-14 to Dewey _axd13 2010-05-17 changed PPD per publisher _axe09 2011-07-02 bk rec'd, to CIP ver. |
||
| 999 |
_c31687 _d31687 |
||